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⵵/ȣ 1994 / ȣ: V.6,no.3,Sept
1() Sputter etching , ȿ
2(Ÿ) Effects of Color Depth on Wool and Silk Fabrics Treated Sputter Etching
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ʷ Wool and silk fabrics dyed with C.l. Acid Black 155 were subjected to sputter etching and exposed to a low temperature argon plasma. Color depth of shade of the fabrics increased considerably, but sputter etching was more effectively than argon low temperature plasma treatment. And measured for any significant chemical modification by ESCA (XPS). Sputter etching and argon low temperature plasma treatments incorporated oxygen atoms into the surface.
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