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⵵/ȣ 1996 / ȣ: V.8,no.2,Apr
1() ö Sputter Etching ó ɻȭ
2(Ÿ) Bathochromic Finish of Dyed Fabrics by Low-Temperature Plasma and Sputter Etching Treatment
() Pak, Pyong Ki (Dept. of Textile Eng., Chunbuk National University, Chonju, Korea) Lee, Mun Cheul (Dept. of Clothing and Textiles, Kyungsung University, Pusan, Korea) Park, Geon Yong (Dept. of Textile Eng., Chungnam Sanup University, Hongsung, Korea)
(Ÿ) Pak, Pyong Ki (Dept. of Textile Eng., Chunbuk National University, Chonju, Korea) Lee, Mun Cheul (Dept. of Clothing and Textiles, Kyungsung University, Pusan, Korea) Park, Geon Yong (Dept. of Textile Eng., Chungnam Sanup University, Hongsung, Korea)
Ҽ() Pak, Pyong Ki (Dept. of Textile Eng., Chunbuk National University, Chonju, Korea) Lee, Mun Cheul (De
Ҽ(Ÿ) Pak, Pyong Ki (Dept. of Textile Eng., Chunbuk National University, Chonju, Korea) Lee, Mun Cheul (De
/ 56 ~ 63 : 8
() Korean
ʷ Low-temperature plasma treatment or sputter etching is of interest as one of the techniques to modify polymer surface. In this study, poly(ethylene terephthalate)(PET), nylon 6 and cotton fabrics dyed three black dyes were subjected to low-temperature argon plasma and also sputter etching. In relation to bathochromic effect, the surface characteristics of the treated fabrics and films were investigated by means of critical surface tension, SEM and ESCA measurement. The depth of shade of fabrics more increased by the sputter etching technique than argon plasma treatment. Many microcraters on the fiber surface formed by the sputter etching resulted in increase of surface area of the fiber and wettability, but the hydrophobic group was increased by the results of ESCA analysis. In particular the change in reflective index of the fibers was much more effective than the chemical composition of the fiber surface on increasing of the depth of shade.
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