| 발행년도/권호 |
2009 년 / 권호: V.21,no.3,Jun |
| 논문제목1(원어) |
Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma |
| 논문제목2(타언어) |
Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma |
| 저자(원어) |
Tae Il Chun and Volker Rossbach1 |
| 저자(타언어) |
Tae Il Chun and Volker Rossbach1 |
| 소속(원어) |
Dong-eui University,1Dresden University of Technology |
| 소속(타언어) |
Dong-eui University,1Dresden University of Technology |
| 시작/끝
페이지 |
19 ~ 25 총페이지 : |
| 언어(원어) |
English |
| 초록 |
Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon
with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 μm 3 μm were obtained, differing in
chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment
and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the
chemical structure of our samples composed of mainly Si O and Si C groups containing aliphatics, carbonyl groups. These results
were obtained by X ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined
with Energy dispersive X ray spectroscopy. |
| 키워드 |
remote micro wave plasma, plasma polymerization and deposition, plasma enhanced chemical vapour
deposition, tetraethoxysilane, scanning electron microscope, energy dispersive X-ray spectroscopy, X-ray
photon spectroscopy, fourier transformed infrared sp |
| 학회지 |
|
| Reference |
http://www.koreascience.or.kr/article/ArticleFullRecord.jsp?cn=OSGGBT_2009_v21n3_19 |
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