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 년도별 목차보기 |
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| 발행년도/권호 |
2006 년 / 권호: V.18,no.6,Dec |
| 논문제목1(원어) |
견직물의 광열화 거동 |
| 논문제목2(타언어) |
Photo-Degradation Behavior of Silk Fabrics |
| 저자(원어) |
이학정․권영숙1․장정대2․이상준3․조현혹 |
| 저자(타언어) |
Hack-Jung Lee, Young-Suk Kwon1, Jeong-Dae Jang2,Sang-Joon Lee3 and Hyun-Hok Cho |
| 소속(원어) |
부산대학교 섬유신소재공학과, 1부산대학교 한국전통복식연구소,부산대학교 의류학과, 3부산대학교 미생물& |
| 소속(타언어) |
Pusan National University |
| 시작/끝
페이지 |
37 ~ 42 총페이지 : 6 |
| 언어(원어) |
Korean |
| 초록 |
Researches to preserve and restore the remaining fabrics as costume heritages have been carried out.
In this study, in order to artificially restore an excavated silk fabrics, degummed silk fabrics and safflower dyed
silk fabrics were prepared for an experiment. These fabrics were photo-degraded by the Xenon arc beam to have
various strength retention(100%, 80%, 60%, 40%, 20%). The fine structure and physical properties of Xenon arc
treated fabrics were investigated with various techniques such as tensile test, weight loss, wide-angle X-ray
diffraction, yellowness, color, SEM etc. Tensile strength and the crystal diffraction intensity of silk fabrics decreased
as Xenon arc beam treatment time increased. Weight loss increased slightly. Strength retention was decreased as
the Xenon arc beam treatment time goes by. (Yellowness of the undyed silk fabrics and L* of the dyed silk fabrics
increased. Whiteness of the undyed silk fabrics and b* of the dyed silk fabrics decreased.) SEM results of the silk
fabrics treated Xenon arc beam show that surface was a little damaged. |
| 키워드 |
Costume Heritages, Silk Fabrics, Photo-degradation, Xenon arc beam treatment, Strength retention |
| 학회지 |
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| Reference |
http://www.koreascience.or.kr/article/ArticleFullRecord.jsp?cn=OSGGBT_2006_v18n6s91_37 |
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