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* PDF α Ͻñ ٶϴ. |
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/ȣ |
2008 / ȣ: V.20,no.1,Feb |
1() |
Poly(dimethylsiloxane) ̼ ż ʹ |
2(Ÿ) |
Rapid Topological Patterning of Poly(dimethylsiloxane) Microstructure |
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躸․ȯ․տ1․â |
(Ÿ) |
Bo-Yeol Kim, Hwan-Moon Song, Young-A Son1, Chang-Soo Lee |
Ҽ() |
泲б, ̿ȭк, ȭа ,1泲б, ̿ȭк, ⼶ý |
Ҽ(Ÿ) |
Chungnam National University |
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8 ~ 15 : 8 |
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Korean |
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We presented the modified decal-transfer lithography (DTL) and light stamping lithography (LSL) as
new powerful methods to generate patterns of poly(dimethylsiloxane) (PDMS) on the substrate. The microstructures
of PDMS fabricated by covalent binding between PDMS and substrate had played as barrier to locally
control wettability. The transfer mechanism of PDMS is cohesive mechanical failure (CMF) in DTL method. In the
LSL method, the features of patterned PDMS are physically torn and transferred onto a substrate via UV-induced
surface reaction that results in bonding between PDMS and substrate. Additionally we have exploited to generate
the patterning of rhodamine B and quantum dots (QDs), which was accomplished by hydrophobic interaction
between dyes and PDMS micropatterns. The topological analysis of micropatterning of PDMS were performed by
atomic force microscopy (AFM), and the patterning of rhodamine B and quantum dots was clearly shown by
optical and fluorescence microscope. Furthermore, it could be applied to surface guided flow patterns in
microfluidic device because of control of surface wettability. The advantages of these methods are simple process,
rapid transfer of PDMS, modulation of surface wettability, and control of various pattern size and shape. It may
be applied to the fabrication of chemical sensor, display units, and microfluidic devices. |
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patterning, PDMS, wettability, quantum dots, microfluid |
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Reference |
http://www.koreascience.or.kr/article/ArticleFullRecord.jsp?cn=OSGGBT_2008_v20n1_8 |
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